By C.K Maiti, G.A Armstrong
The main major characteristic of this paintings is that it combines 3 precise themes - know-how, machine layout and simulation, and functions - in a entire approach.
This booklet is meant to be used via senior undergraduate or first-year graduate scholars in utilized Physics, digital and electric Engineering, and fabrics Sciences, and as a reference for engineers and scientists fascinated by semiconductor machine examine and improvement for RF functions.
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Additional info for Applications of silicon-germanium heterostructure devices
Mechanical equilibrium theory assumes the existence of a threading dislocation. The energy required to glide a threading dislocation into a misﬁt dislocation is balanced with the strain energy from the lattice mismatch to deﬁne the critical thickness as a function of lattice mismatch. 3. Critical layer thickness versus Ge content showing stable, metastable and relaxed ranges of Si1−x Gex layers on Si. (After Schuppen A et al 1995 J. Mater. , Mater. Electron. ) relieve the strain energy. 042x. For a detailed derivation of the critical thickness, the reader may refer to an excellent review by Jain and Hayes .
Pp 109–16  Lanzerotti L D, St Amour A, Liu C W, Sturm J C, Watanabe J K and Theodore N D 1996 Si/Si1−x−y Gex Cy /Si heterojunction bipolar transistors IEEE Electron Device Lett. 17 334–7  Osten H J, Knoll D, Heinemann B and Tillack B 1998 Carbon doping of SiGe heterobipolar transistors Proc. Silicon Monolithic Integrated Circuits in RF Systems pp 19–23  Osten H J, Knoll D, Heinemann B and Schley P 1999 Increasing process margin in SiGe heterojunction bipolar technology by adding carbon IEEE Trans.
Therefore, much shorter channel lengths (down to 20 nm) become feasible. At the source side of the device, a heterojunction is used which keeps the barrier for conduction in the oﬀ-state constant and not aﬀected by the drain voltage. In order to have conduction in the on-state, the source side closest to the channel region is intrinsic. This allows for Fermi-level modulation by the action of the overlapping gate and thus conduction. The DIBL eﬀect no longer exists . The experimental evidence of the enhancement of out-of-plane hole mobility in SiGe using a vertical p-MOSFET structure, fabricated by high-dose Ge implantation followed by solid phase recrystallization, has been reported .